Several enhancements help maximize the use of EtherCAT capabilities, as well as boost process yields and productivity for next-generation tools and fabs. Embedded diagnostics use real-time EtherCAT data acquisition capabilities for advanced fault detection and classification; an ultra-stable flow sensor (?0.15 percent of S.P. drift per year) allows tighter low set point accuracy and reduces maintenance requirements; improved valve shutdown reduces valve leak-by to minimize potential first wafer effects. A reduction in pressure transient insensitivity to less than one percent of S.P. with five psi per second pressure perturbations reduces crosstalk sensitivity for consistent mass flow delivery. The controllers are appropriate for use in semiconductor etch tools; thin-film chemical vapor deposition systems (CVD, MOCVD, PECVD, ALD); physical vapor deposition (PVD) systems and epitaxial process systems. The EtherCAT interface will be available on the GF Series low-flow models (GF100/120/125); the high-flow devices (GF101/121/126); and safe delivery system (SDS) models GF120 XSL and GF120 XSD.
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